Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

5 天之前 · This source could produce EUV lights with a 13.5nm wavelength, which meets the demands of the photolithography market. Under the new system currently being trialed at one of Huawei’s facilities ...

2024年11月28日 · Extreme ultraviolet lithography (EUVL) was recently adopted by the semiconductor industry as the leading-edge lithography technique for continued miniaturization of semiconductor devices in...

Extreme ultraviolet radiation (EUV or XUV) or high-energy ultraviolet radiation is electromagnetic radiation in the part of the electromagnetic spectrum spanning wavelengths shorter than the hydrogen Lyman-alpha line from 121 nm down to the X-ray band of 10 nm.

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2021年10月5日 · Extreme ultraviolet (EUV) lithography is a soft X-ray technology, which has a wavelength of 13.5nm. Today’s EUV scanners enable resolutions down to 22nm half-pitch. In a system, an EUV light source makes use of a high power laser to create a plasma.

4 天之前 · China’s LDP-based EUV system produces 13.5nm EUV light by evaporating tin between electrodes and then ionizing it through high-voltage discharge, creating a plasma source for lithography. Unlike ASML’s LPP method, which depends on high-powered lasers and FPGA-driven real-time controls, LDP offers a different approach to achieving EUV light ...

2025年3月21日 · Promoting EUV Lithography via Workshops, Consulting & Education. 2021 EUVL Workshop coming this summer!

2025年1月24日 · China’s scientists are pioneering new approaches in the development of extreme ultraviolet (EUV) lithography, aiming to enable the mass production of advanced semiconductor chips as they work to overcome stringent sanctions imposed by the United States.

2025年3月5日 · The EUV light is directed by an elaborate series of mirrors onto the surface of a moving wafer, where it creates the desired pattern of imprinted circuits. ASML.