Hexafluorobutadiene is an organofluorine compound with the formula (CF 2 =CF) 2. A colorless gas, it has attracted attention as an etchant in microelectronics. It is the perfluoroanalogue of butadiene. It can be prepared by coupling of fluorinated C 2 precursors.

Hexafluoro-1,3-butadiene | C4F6 | CID 69636 - structure, chemical names, physical and chemical properties, classification, patents, literature, biological activities, safety/hazards/toxicity information, supplier lists, and more.

The molecular formula C4F6 (molar mass: 162.0 g/mol, exact mass: 161.9904 u) may refer to:

hexafluoro-1,3-butadiene (C4F6) is primarily used in Reactive Ion Etching (RIE), Deep Reactive Ion Etching (DRIE) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) on substrates after the photolithographic step in the seminconductor manufacturing process.

Sifren® 46 (C4F6 or Hexafluoro-1,3-butadiene) is an unsaturated fluorocarbon with an alternating double bond. It is a colorless, odorless, toxic, flammable gas showing very high performance for plasma, ion beam, or sputter etching in semiconductor devices manufacturing with Xenon (Xe) and Argon (Ar) as carrier or dilution gas.

Hexafluorocyclobutene | C4F6 | CID 12767 - structure, chemical names, physical and chemical properties, classification, patents, literature, biological activities, safety/hazards/toxicity information, supplier lists, and more.

Hexafluorobutadine (Hexafluoro-1,3-butadiene) C4F6 is used for dielectric etch applications. Hexafluoro-1,3-butadiene is a toxic, colorless, odorless, flammable liquefied compressed gas.

Jun 1, 2003 · Hexafluoro-1,3-butadiene (C 4 F 6) is a relatively new etch gas for the manufacturing of semiconductor devices, especially in critical etch processes that need high aspect ratios and selectivity. It is able to combine very high performance with a benign environmental effect.

Δ vap H (kJ/mol) Temperature (K) Reference Comment; 25.9: 288. Bobbo, Fedele, et al., 2002: Based on data from 273. to 343. K.; AC

All mass spectra in this site (plus many more) are available from the NIST/EPA/NIH Mass Spectral Library. Please see the following for information about the library and its accompanying search program.

ChemSpider record containing structure, synonyms, properties, vendors and database links for Hexafluoro-1,3-butadiene, 685-63-2, LGPPATCNSOSOQH-UHFFFAOYSA-N

Hexafluoro-1,3-butadiene is an environmentally friendly dry etching gas with low GWP, high etching rate, high selectivity, and high aspect ratio. Hexafluorobutadiene (C4F6) is a fluorinated hydrocarbon compound that has a number of applications in the semiconductor industry, particularly in the area of etching.

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Structure of Hexafluoro-1,3-butadiene (C4F6) Powered by CC-DPS Delivering 2,100+ Information Sets per Compound.

Jan 11, 2002 · Hexafluoro-1,3-butadiene (Sifren 46, Ausimont; ASHRAE Code R2316) is a fluoro compound with two double bonds in the molecule (C4F6) showing very high performance for plasma, ion beam, or sputter etching in semiconductor devices' manufacturing.

Notes. Go To: Top Data from NIST Standard Reference Database 69: NIST Chemistry WebBook The National Institute of Standards and Technology (NIST) uses its best efforts to deliver a high quality copy of the Database and to verify that the data contained therein have been selected on the basis of sound scientific judgment.

These firms play an integral role in powering various industries, from computing and telecommunications to aviation and healthcare. Primarily, they design, produce, and supply semiconductors- key components in numerous electronic devices.

Intel is an American multinational corporation and technology company headquartered in Santa Clara, California.Processors are manufactured in semiconductor fabrication plants called "fabs" which are then sent to assembly and testing sites before delivery to customers. Intel has stated that approximately 75% of their semiconductor fabrication is performed in the United States.

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