Deposition NT333™ Series | Products and Service(products)
NT333™ is TEL’s first semi-batch chamber for ALD (Atomic Layer Deposition). It offers thin film thickness control at the atomic level while providing exceptional film quality and high …
Products and Services(all products) | Tokyo Electron Ltd.
TEL's first semi-batch ALD (atomic layer deposition) system for 300mm wafers. Employing original deposition technique, the system achieves excellent film thickness control and …
Products - Tokyo Electron Ltd.
TEL's first semi-batch ALD (atomic layer deposition) system for 300mm wafers. Employing original deposition technique, the system achieves excellent film thickness control and …
TEL Tokyo Electron Deposition NT333™ Series Deposition Tool
NT333™ is TEL’s first semi-batch chamber for ALD (Atomic Layer Deposition). It offers thin film thickness control at the atomic level while providing exceptional film quality and high …
Status and prospects of plasma-assisted atomic layer deposition
2019年3月18日 · Besides the general distinction between direct plasma, remote plasma, and radical-enhanced ALD reactors, there is also a range of reactor concepts for temporal, wafer …
Telindy Plus Thermal Processing System - Energy XPRT
TELINDY PLUS™ applications range from traditional silicon treatments such as diffused oxides and anneals to LPCVD Si (Poly Si, a-Si), SiO2, Si3N4 to leading edge ALD SiO2, Si3N4 and …
BALD Engineering - Born in Finland, Born to ALD: Tokyo Electron …
2016年1月2日 · Tokyo Electron Limited (TEL) announced today that it will begin accepting orders for the Triase+TM EX-IITM TiN* Plus HT single-wafer metallization system in April 2016. Its …
BALD Engineering - Born in Finland, Born to ALD: Tokyo Electron …
2016年8月11日 · "The Triase+ EX-II TiON is a product with significant cost and performance benefits that can meet the continual demand for miniaturization in semiconductor …
Tokyo Electron Ltd. (TEL) TELINDY Plus ALD HighK. Furnace Exhaust Connection Poi - Top Connection - Qty1 Cooling Water Connection Point - Bottom Connection - Qty1 3.2.1- Gas …
ALD/ALE2024 | News Room | Tokyo Electron Ltd.
2024年8月2日 · This conference will feature presentations on the latest research on the science and technology of atomic layer deposition (ALD) and atomic layer etching (ALE), which are …