Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H 2 SiCl 2. In its major use, it is mixed with ammonia (NH 3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS·NH 3 (i.e. 16:1), usually results in lower stress nitride films.

Dichlorosilane is a flammable and poisonous gas, with a strong repulsive odor. It is easily ignited in air, reacts with oxidizing agents, is very toxic by inhalation, and is a strong irritant to skin, eyes and mucous membranes. Under prolonged exposure to fire or intense heat the container may rupture violently or rocket. dichlorosilane.

Chlorosilanes, such as DICHLOROSILANE, are compounds in which silicon is bonded to from one to four chlorine atoms with other bonds to hydrogen and/or alkyl groups. Chlorosilanes react with water, moist air, or steam to produce heat and toxic, corrosive fumes of hydrogen chloride. They may also produce flammable gaseous H2.

2025年1月6日 · Dichlorosilane, SiH2Cl2, is a colourless, toxic, flammable, corrosive liquid shipped at its vapour pressure of 9.1 psig (63 kPa) at 70°F (21°C). liquefied gas with pungent odor. Highly corrosive in humid conditions.

2023年3月12日 · Lewis structure of SiH2Cl2 contains a single bond between the Silicon (Si) & Hydrogen (H) atoms as well as between the Silicon (Si) & Chlorine (Cl) atoms. The Silicon atom (Si) is at the center and it is surrounded by two Hydrogen (H) and two Chlorine atoms (Cl).

ジクロロシラン (dichlorosilane) は、 化学式 H 2 SiCl 2 で表わされる 化合物 である。 一般的には略称の DCS で呼ばれる。 その主な用途では、 LPCVD チャンバー内でアンモニア (NH 3）と混合され、半導体処理で 窒化ケイ素 を成長させる。 DCS・NH 3 の濃度が高い（つまり16：1）と、通常、応力の低い窒化物膜が得られる。 ジクロロシランは、1919年に モノシ …

Trichlorosilane is produced on the largest scale. The parent chlorosilane is silicon tetrachloride (SiCl4). [1] These include chlorosilane (H3SiCl), dichlorosilane (H2SiCl2), and, most importantly trichlorosilane (HSiCl3). The idealized equation for the production of trichlorosilane is: [2]

2024年10月13日 · Dichlorosilane, a compound with the formula SiH2Cl2, plays a crucial role in the semiconductor industry. Its unique properties make it essential for producing high-purity silicon, which is vital for electronic devices.

SiH2Cl2 (DCS); Disilane which is more expensive in Silicon Epi applications and in advanced logics. Other applications include some spacer applications and some Dieletrics.

It is shipped as a liquefied gas in low pressure steel cylinders at a pressure of 66 kPa (9.6 psig) at 20°C. Corrosive and irritating to the upper and lower respiratory tracts, skin and eyes. It hydrolyzes very rapidly in water or with the moisture in the air yielding hydrogen chloride.