Immersion lithography - Wikipedia
Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process. It involves using a liquid medium, typically water, between the lens and the wafer during exposure.
How immersion lithography saved Moore’s Law – Stories - ASML
2023年8月2日 · The team narrowed the solution space enough to identify a basic engineering mechanism: dubbed the 'immersion hood,' this new part of the lithography system formed a ring around the last lens element to control the puddle.
Immersion lithography: its history, current status and future prospects
2008年12月4日 · The current work in immersion lithography started in 2001 with the report of Switkes and Rothschild. Although their first proposal was at 157 nm wavelength, their report in the following year on 193 nm immersion with purified water turned out to be the turning point for the introduction of water-based 193 nm immersion lithography.
Here’s Everything You Need To Know About Immersion Lithography
2024年4月30日 · What Is Immersion Lithography? In semiconductor manufacturing, immersion lithography creates smaller and more intricate features on wafers. It enhances the resolution and precision of the ...
193nm immersion lithography: Status and challenges - SPIE
Immersion lithography is a lithography enhancement technique that replaces the usual air gap between the final lens element and the photoresist surface with a liquid medium with a refractive index greater than one.
Immersion Lithography - SpringerLink
2016年11月29日 · Immersion lithography utilizes liquids with refractive indices >1 (the index of air) to enable sub-45-nm feature size (or half-pitch) patterning for semiconductor integrated circuits.
Advanced processes for 193-nm immersion lithography / Yayi Wei and Robert L. Brainard. p. cm. Includes bibliographical references and index. ISBN 978-0-8194-7557-2 (alk. paper) 1. Immersion lithography. 2. Semiconductors--Etching. 3. Integrated circuits--Design and construction. I. Brainard, Robert L. II. Title. TK7872.M3W45 2009 621.3815'31--dc22
Exploring the capabilities of immersion lithography
Immersion lithography has recently emerged as the leading candidate for extending 193 nm lithography to the 45 nm lithography node and beyond. By immersing the wafer in a high index fluid, lens designs with numerical apertures (NAs) approaching the …
4. Immersion lithography technology supports leading-edge ... - Nikon
With the progress of miniaturization, however, a theoretical barrier was reached that prevented existing lithography technology from handling the smaller sizes. The solution to this problem was Immersion Lithography Technology, which Nikon incorporated into its …
The next phase for immersion lithography - SPIE Digital Library
2006年3月15日 · Immersion Lithography is now the most important technique for extending optical lithography's capabilities and meeting the requirements of the Semiconductor Industry Association (SIA) roadmap.