EUV lithography systems – Products - ASML
Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.
Making EUV: from lab to fab – Stories - ASML
2022年3月30日 · Designing the laser-produced plasma (LPP) source involved hitting droplets of tin 50,000 times per second – twice – to vaporize them, creating a plasma 40 times hotter than the surface of the sun to emit EUV light.
Light & lasers - Lithography principles| ASML
EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. This wavelength is more than 14 times shorter than DUV light. EUV light occurs naturally in outer space. But to make EUV lithography possible, we needed to engineer a way to create such light within a system.
5 things you should know about High NA EUV lithography - ASML
2024年1月25日 · High NA EUV is the next step in our constant pursuit of shrink. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The new platform, known as EXE, offers chipmakers a CD of 8 nm.
EUV light source engineers win Leibinger international award - ASML
2021年10月22日 · Three ASML engineers at the forefront of developing the EUV light source – a revolution in photolithography – have received the prestigious Leibinger international award. Hear the story of three engineers who achieved the impossible, increasing EUV source power for high-volume manufacturing.
Cymer | ASML - Supplying the semiconductor industry
ASML acquired Cymer in 2013 to accelerate the development of extreme ultraviolet (EUV) semiconductor lithography. Based in San Diego, California, Cymer was founded in 1986 by two college friends Robert Akins and Richard Sandstrom to develop laser and lithography light source technology for the semiconductor industry.
Indistinguishable from magic: the EUV pellicle – Stories - ASML
2022年9月14日 · The pellicle is one of the breakthroughs that enabled EUV (extreme ultraviolet) lithography in high-volume microchip manufacturing. In this story, three physicists describe how ASML researched this ‘impossible’ technology and brought it to market.
TWINSCAN NXE:3600D - EUV lithography systems - ASML
The NXE platform uses 13.5 nm EUV light, generated by a tin-based plasma source, to expose 300 mm wafers with a max exposure field size of 26 mm x 33 mm. The NXE:3600D is equipped with reflective projection optics with a numerical aperture (NA) of 0.33.
ASML to acquire Cymer to accelerate development of EUV …
2012年10月17日 · Progress continues on improving the productivity of the EUV systems currently limited by the light source. Cymer’s EUV light sources have for some time been exposing wafers at up to 11 Watts source power at customer facilities, resulting in NXE:3100 productivity of up to 7 wafers per hour.
EUV Research Scientist
The EUV source technology development team is responsible for identifying system-level operating points for stable EUV production generated from laser produced plasmas and helps to chart the path to increase EUV power to meet the future needs of the Lithography industry.