Extreme ultraviolet lithography - Wikipedia
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
Extreme ultraviolet - Wikipedia
Extreme ultraviolet radiation (EUV or XUV) or high- energy ultraviolet radiation is electromagnetic radiation in the part of the electromagnetic spectrum spanning wavelengths shorter than the hydrogen Lyman-alpha line from 121 nm down to the X-ray band of 10 nm.
EUV lithography systems – Products - ASML
Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.
Extreme ultraviolet lithography - Nature Reviews Methods Primers
2024年11月28日 · Extreme ultraviolet lithography (EUVL) was recently adopted by the semiconductor industry as the leading-edge lithography technique for continued miniaturization of semiconductor devices in...
Here’s Everything You Need To Know About EUV Lithography
2024年4月28日 · Extreme ultraviolet (EUV) lithography is a cutting-edge technique to manufacture modern computer chips. It’s a type of photolithography, which utilises light to etch patterns onto silicon...
Advantages of EUV lithography are wide process windows, high throughput (once source power and availability specs are met), and extendibility. Disadvantages of EUV lithography are higher costs & complexity (than ArFi lithography) and infrastructure immaturity.
This Machine Could Keep Moore’s Law on Track - IEEE Spectrum
2023年7月29日 · Called high-numerical-aperture EUV lithography, it involves a major overhaul of the system’s internal optics. High-NA EUV should be ready for commercial use in 2025, and chipmakers are depending on its capabilities to keep their …
Lithography gets extreme - Nature Photonics
Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of...
EUV: Extreme Ultraviolet Lithography - Semiconductor …
2021年10月5日 · Extreme ultraviolet (EUV) lithography is a soft X-ray technology, which has a wavelength of 13.5nm. Today’s EUV scanners enable resolutions down to 22nm half-pitch. In a system, an EUV light source makes use of a high power laser to create a plasma.
Extreme ultraviolet (EUV) lithography - ScienceDirect
2014年1月1日 · This chapter describes extreme ultraviolet (EUV) lithography, a photon-based lithography technology with the potential to enable the continuation of Moore’s law throughout the 2010s and beyond. In this introduction we motivate the …