A comparative study of Hillock formation in aluminum films
- 已发布: 1995/12/15
- DOI: 10.1016/0040-6090(95)06941-0
- 引用者: 0
- Keywords: Alloys; Aluminium; Stress
- 页数: 5
Studies were conducted to evaluate the performance of a variety of aluminum alloys with respect to hillock formation. Specifically, the effects of film composition, deposition temperature, and underlayer on hillock formation were investigated. The film compositions included pure Al, Al with 1.5 wt.%...Hillock growth on aluminum and aluminum alloy films
1992年10月30日 · In the case of Al on oxidized Si substrates, heating the films causes a planar compressive stress that often results in irreversible hillock formation. In both cases the hillocks …
Effect of aluminium oxide caps on hillock formation in aluminium …
1999年7月30日 · An anodic oxide or a sputter-deposited oxide layer was intentionally formed on the top of the Al alloy films, and subsequently annealed in a vacuum of less than 1×10 −4 Pa. …
- Aluminum Hillock Formation 的研究
Suppressing hillock formation in Si-supported pure Al films
2018年4月11日 · To suppress the hillock formation and hence improve the service performance of pure Al thin films deposited on Si substrate, dependence of hillock formation on film thickness …
A transmission electron microscopy study of hillocks in thin …
1991年1月1日 · This paper reports a study of hillock formation in Al films of thicknesses in the interval 0.25–2.2 μm and which have been deposited by electron beam evaporation. Hillock …
(PDF) Hillock Formation, Metal Lifting and Voiding of …
2004年12月8日 · study shows the influence of different final annealing temperatures on hillock formation and voiding using a Ti/TiN/AlCu/T iN metalstack. A reduction of the maximum temperature of the
- 其他用户还问了以下问题
Effect of capping layer on hillock formation in thin Al films
The effect of capping layers on hillock formation has been studied in pure aluminum films. For this purpose, different capping materials (Ti, Mo, SiO 2) of various thicknesses (from 200 Å to …
Hillock formation in thin metallic films has been reported frequently in the literature [1, 3, 4, 5]. In this study, we observed a new type of hillock in Al thin films. The microstructure of the hillocks …
Suppression of hillock formation in thin aluminum films
The present invention relates to electrical interconnection lines which suppress hillock formation in thin aluminum metal layers for use in semiconductor devices including field emission...
Relationship Between the Void and Hillock Formation and the …
2011年2月15日 · Void and hillock formation during annealing was studied depending on the deposition conditions. Aluminum films were deposited onto oxidized silicon substrates by the …
