AZ 10XT Series materials contain PGMEA (1-Methoxy-2-propanol acetate). Refer to the current version of the MSDS and to local regulations for up to date information on safe handling and …
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AZ 10XT Photoresist (520cP) - 0.50 l - MicroChemicals GmbH
AZ® 10XT is an i- and h-line (not g- line !) sensitive positive thick photoresist, as the successor to the AZ® 9260 and is largely identical in construction, but with a different surfactant. In contrast …
AZ® 10XT (520 cP) photoresist was tested side by side vs. AZ® 9260 at a film thickness of 12.0 μm. The two products were compared for coat uniformity, thermal stability, and lithographic …
AZ® 10XT positive photoresist is designed for 5 to 25 micron film thickness in high performance rerouting processes and other plating applications. Three viscosities are available to cover a …
AZ 10XT正型光刻胶 - 汶颢股份 - whchip.com
az 10xt光刻胶产品特点： 1) 高分辨率，高纵宽比. 2) 高附着性，对电镀工艺高耐受性. 3) 多种粘度可供选择. az 10xt光刻胶参考工艺： 前烘 ： 100℃ 90秒以上 (dhp) 曝光 ： i线步进式曝光机/ …
AZ 10XT 超厚膜高分辨率I线正胶 - 微流控芯片实验室整体解决方案
az 10xt 是一种超厚膜，高分辨率，高纵宽比 i 线正型光刻胶，适用于微电镀工艺。 特征： 1 ）高分辨率，高纵宽比. 2 ）高附着性，对电镀工艺高耐受性. 3 ）多种粘度可供选择. az 10xt 系列 …
Photoresist - MicroChemicals GmbH
AZ® 10XT achieves a resist film thickness of approx. 6 µm at a spin speed of 4000 rpm; with an appropriately adjusted spin profile, the resist film thickness range of approx. 4.5 - 20 µm can …
配备 KLA 突破性的 DDITM(滚筒式直接成像)技术,Infinitum 10/10XT 可实现最佳板材处理和高速成像,提供高良率和产能。 这一全新解决方案采用 KLA 经市场验证的 LSOTM(大镜面扫描光学) …
AZ 10XT正型光刻胶-迈库弗洛微流控技术（常州）有限公司
AZ 10XT匀胶厚度约5~16微米. AZ 10XT光刻胶应用于电镀工艺的超厚膜，高分辨率I线正型光刻胶。 超厚膜，高分辨率，高纵宽比I线正型光刻胶，适用于微电镀工艺。 AZ 10XT匀胶厚度 …