
Hexafluorobutadiene - Wikipedia
Hexafluorobutadiene is an organofluorine compound with the formula (CF 2 =CF) 2. A colorless gas, it has attracted attention as an etchant in microelectronics. It is the perfluoroanalogue of butadiene. It can be prepared by coupling of fluorinated C 2 precursors.
Hexafluoro-1,3-butadiene | C4F6 | CID 69636 - PubChem
Hexafluoro-1,3-butadiene | C4F6 | CID 69636 - structure, chemical names, physical and chemical properties, classification, patents, literature, biological activities, safety/hazards/toxicity information, supplier lists, and more.
Use equipment rated for cylinder pressure. Do not open valve until connected to equipment prepared for use. Use a back flow preventative device in the piping. Use only equipment of compatible materials of construction. Always keep container in upright position. Approach suspected leak area with caution.
C4F6 - Wikipedia
The molecular formula C4F6 (molar mass: 162.0 g/mol, exact mass: 161.9904 u) may refer to:
Hexafluorocyclobutene | C4F6 | CID 12767 - PubChem
2021年10月14日 · Hexafluorocyclobutene | C4F6 | CID 12767 - structure, chemical names, physical and chemical properties, classification, patents, literature, biological activities, safety/hazards/toxicity information, supplier lists, and more.
1,3-Butadiene, 1,1,2,3,4,4-hexafluoro- - NIST Chemistry WebBook
All mass spectra in this site (plus many more) are available from the NIST/EPA/NIH Mass Spectral Library. Please see the following for information about the library and its accompanying search program.
Hexafluorocyclobutene - Wikipedia
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C4F6 ─ Hexafluorobutadiene VLSI - EMD Group
Hexafluorobutadine (Hexafluoro-1,3-butadiene) C4F6 is used for dielectric etch applications. Hexafluoro-1,3-butadiene is a toxic, colorless, odorless, flammable liquefied compressed gas.
Hexafluorobutadiene (HFBD, C4F6) (CAS 148043-73-6) - Valliscor
hexafluoro-1,3-butadiene (C4F6) is primarily used in Reactive Ion Etching (RIE), Deep Reactive Ion Etching (DRIE) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) on substrates after the photolithographic step in the seminconductor manufacturing process.
C4F6 1,3 Hexafluorobutadiene - A New Etching Gas: Studies on …
2003年6月1日 · Hexafluoro-1,3-butadiene (C 4 F 6) is a relatively new etch gas for the manufacturing of semiconductor devices, especially in critical etch processes that need high aspect ratios and selectivity. It is able to combine very high performance with a benign environmental effect.