Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

EUV lithography makes scaling more affordable for chipmakers and allows the semiconductor industry to continue its pursuit of Moore’s Law. EUV systems are used to print the most intricate layers on a chip, with the rest of the layers printed using various DUV systems.

2024年11月28日 · Extreme ultraviolet lithography (EUVL) was recently adopted by the semiconductor industry as the leading-edge lithography technique for continued miniaturization of semiconductor devices in...

Extreme ultraviolet radiation (EUV or XUV) or high- energy ultraviolet radiation is electromagnetic radiation in the part of the electromagnetic spectrum spanning wavelengths shorter than the hydrogen Lyman-alpha line from 121 nm down to the X-ray band of 10 nm.

2023年6月26日 · In the case of EUV (or extreme ultraviolet) lithography, the light used is well beyond the visible light spectrum, with wavelengths only about 13 nanometers wide. This light …

2024年4月28日 · Extreme ultraviolet (EUV) lithography is a cutting-edge technique to manufacture modern computer chips. It’s a type of photolithography, which utilises light to etch patterns …

2025年3月8日 · China's domestic extreme ultraviolet (EUV) lithography development is far from a distant dream. The newest system, now undergoing testing at Huawei's Dongguan facility, leverages laser-induced discharge plasma (LDP) technology, representing a potentially disruptive approach to EUV light generation. The system is scheduled for trial production in Q3 2025, with mass manufacturing targeted for ...

A global leader in the production of at-wavelength extreme ultraviolet (EUV) metrology tools, EUV Tech supplies the semiconductor manufacturing industry with leading-edge metrology solutions using extreme ultraviolet light and soft-x-ray technology.

2021年11月16日 · Welcome to the Center for Extreme Ultraviolet Science and Technology – an Engineering Research Center (ERC) exploring the development of compact coherent extreme ultraviolet (EUV) sources and their applications in challenging scientific …

2025年3月21日 · The 2025 Extreme Ultraviolet Lithography (EUVL) and Source Workshop will be held at MIT Lincoln Laboratory, from June 21-26, 2025. This annual workshop, organized by EUV Litho, Inc., is a unique forum to discuss the challenge and progress of EUVL as it is being implemented in state-of-the-art semiconductor manufacturing.