Sho Iwayama (Conceptualization, Supervision, Writing – review & editing) 1. Department of Materials Science and Engineering, Meijo University ... By Wavelength (325 nm, 354 nm, and 442 nm), By Application (Spectroscopy, Microelectronics Manufacturing, Laser Machining, Medical Procedures, and Others (Microlithography, others)), and Regional ...

The blueshift in wavelength between the light source (456 nm) and the longest wavelength absorbance peak (411 nm) is about twice as large as Dai et al. (390 nm source/378 nm peak) and is attributed to the light source being nonmonochromatic and DFT performance (e.g., functional/basis set). DFT performance can cause variation by ±30 nm.

in the x and y directions were better than 1.5 and 1.6, respectivel y, as sho wn in Fig. 7 (c). The RMS value of the output pow er of 355 nm light within 4.5 hours is 0.74%, as shown in Fig. 7 (d).

Based on the above characteristics, by modulating the device state, the device exhibits a visible–infrared broad-spectrum photoresponse and wavelength-selective single-wavelength imaging. The simulation results of the carrier distribution in the device channel in the Q = 1 and Q = 3 states in the dark, under 532 nm illumination, and under ...

Results from the design show that the module effectively spans the required 115 nm-400 nm wavelength range for testing, demonstrating high efficiency. Specifically, there is a 2.85 times increase in photon collection efficiency within the 115 nm-145 nm range and a 6.03 times increase within the 145 nm-400 nm range. This research is anticipated ...