EUV lithography systems – Products - ASML
Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.
5 things you should know about High NA EUV lithography - ASML
2024年1月25日 · High NA EUV is the next step in our constant pursuit of shrink. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The new platform, known as EXE, offers chipmakers a CD of 8 nm.
TWINSCAN EXE:5000 - EUV lithography systems - ASML
The TWINSCAN EXE:5000 is the first 0.55 NA, or ‘High NA’, EUV lithography system. Its 8 nm resolution will enable chipmakers to print with a single exposure features 1.7 times smaller – and therefore achieve transistor densities 2.9 times higher …
Making EUV: from lab to fab – Stories - ASML
2022年3月30日 · In the Spring of 2008, SUNY used their demo tool to produce the world’s first full-field EUV test chips. And in 2009, ASML opened the buildings that would house our 10,000 m2 cleanrooms and workspaces for EUV development and production at our headquarters in Veldhoven, the Netherlands.
ASML ships industry's first EUV tools to Albany NanoTech and IMEC
2006年8月29日 · ASML Holding NV (ASML) announced today that it shipped two extreme ultraviolet (EUV) alpha demo tools (ADT) to customers. Both the College of Nanoscale Science and Engineering (CNSE) of the State University of New York (SUNY) at Albany, NY, and the nanoelectronics research institute IMEC in Leuven, Belgium, have received these industry-first ...
Light & lasers - Lithography principles| ASML
EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. This wavelength is more than 14 times shorter than DUV light. EUV light occurs naturally in outer space. But to make EUV lithography possible, we needed to engineer a way to create such light within a system.
TWINSCAN NXE:3400C – EUV lithography systems - ASML
Combining high productivity, excellent image resolution, matched overlay to EUV NXE and ArFi NXT tools and focus performance, the TWINSCAN NXE:3400C provides lithography capability complementary to ASML’s ArFi technology.
DUV lithography systems | Products - ASML
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.
TWINSCAN NXE:3600D - EUV lithography systems - ASML
The EUV lithography solutions provided by the TWINSCAN NXE:3600D are complementary to those provided by our TWINSCAN NXT systems based on ArF immersion technology. The NXE platform uses 13.5 nm EUV light, generated by a tin-based plasma source, to expose 300 mm wafers with a max exposure field size of 26 mm x 33 mm.
Our history | ASML - Supplying the semiconductor industry
In 2010, we shipped the first prototype extreme ultraviolet (EUV) lithography tool (TWINSCAN NXE:3100) to the research facility of an Asian chipmaker, marking the beginning of a new era in lithography. EUV lithography uses light of a shorter wavelength to manufacture smaller chip features, resulting in faster, more powerful chips.
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