
高純度フッ化カルボニル(COF2/Cas.353-50-4) | UniPo株式会社
大気中のCO2やメタンも温暖化の原因の一つですが、温室効果ガスは地球温暖化係数(GWP:Global Warming Potential)が非常に高く、温室効果の大きいものです。
半导体工业用含氟清洗气体研究进展 - 百度文库
COF2的GWP值约为l,大气寿命近似为零,环境非常友好。 与传统清洗 剂C2F6、NF3相比,COF2的环境友好优势非常明显,具有低的GWP和MMTCE, GWP值COF2/NF3=1/10970,COF2/C2F6=1/9200;MMTCE值COF2/NF3=1/10, COF2/C2F6=1/100。 另外,COF2爆炸可能性为O,与Sill4混合的安全比例范围非 常宽。 尽管COF2属有毒物质,但废气可通过后续水洗涤轻易去除,后处理系统简 单,后处理成本低。 …
CN106115651A - 合成碳酰氟的装置及方法 - Google Patents
碳酰氟(cof2)广泛用于半导体制造过程中的清洁气体和刻蚀气体,由于其具有非常低的全球变暖潜能(gwp),故逐步替代了全氟化碳(pfc)和三氟化氮(nf3)等常规的清洁气体和刻蚀气体,另外碳酰氟在液晶制造领域的应用也有报道。
New Alternative Gas Process Feasibility Study for PFC Emission ...
2003年1月1日 · In the present project, COF2 has been judged to be the most attractive candidate alternative to the conventional cleaning gas C2F6 and NF3. So, in the present fiscal year, a marathon test using mass production line level PE-CVD machine and a task force working on ways of ensuring the safe usage of COF2 are progressing.
Replacing high global warming potential (GWP) gases with lower GWP or GWP-free gases is the most effective solution to further reducing PFC emission.
Since 1995 (before COP3), we at Samco have been researching systems that capture and disintegrate perfluorocarbon compounds (PFCs). This article introduces Samco’s recent research on dry etching with carbonyl difluoride (COF2), which has lower global warming potential (GWP) than tetrafluoromethane (CF4) and trifluoromethane (CHF3).
碳酰氟的研究进展_参考网 - fx361.cc
2017年3月24日 · 高島正之等 [1]提出了一种使用CO2与F2在气相下直接反应制备COF2的方法,发现CO2和F2的反应摩尔比必须控制在合适的范围之内,过低则副产物CF4的生成量过大,收率较低,过高反应活性较低。 此外,该方法对于反应温度的要求也严格,过高则会导致大量生成副产物CF4,过低则会降低产率。 使用该方法生产COF2的最高收率仅为47 %,收率较低,未反应的原料气会增加后期纯化的负担,不利于工业化生产。 相比于CO2,更多的报道关注将CO和F2直接 …
Showa Denko, 고순도 COF2 특수가스플랜트 건설 - 아이가스저널
2011年2月22日 · 일본 쇼와덴코는 최근 후쿠시마현 아이즈와카마스 지역에 신규 고순도 불화카르보닐(cof2) 플랜트의 건설을 시작했다고 밝혔다. COF2는 LCD 생산공정 중 에칭 및 클리닝 공정의 친환경성을 강화할 수 있는 산업용 특수가스로써 신규 플랜트의 생산능력은 연산(年産 ...
SDK to produce high purity COF2 for LCD panels - 아이가스저널
The global warming potential (GWP) of COF2 is approximately 1, the level of carbon dioxide (CO2). This value is very small compared with GWP of 23,900 for sulfur hexafluoride (SF6), a typical etching gas.
Greener Options for Plasma Cleaning in Semiconductor …
2025年3月5日 · Discover greener plasma cleaning solutions in semiconductor manufacturing—explore how low-GWP alternatives like Carbonyl Fluoride (COF2) can help reduce emissions and support sustainable innovation.