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afzhan
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完全不同于ASML!中国成功研发全新DUV光刻
材料突破:研发团队可能攻克了高损伤阈值、高非线性转换效率的激光晶体材料(如KBBF、CLBO等),解决了DUV波段倍频过程中的光学损耗和热管理问题。 系统集成:通过优化谐振腔设计和激光脉冲控制技术,实现了高功率、窄线宽的DUV输出,满足精密光刻或科研需求。
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