A research team has successfully developed a new composition and processing technology for transparent plasma-resistant high-entropy ceramics. This innovation is the first of its kind in the world and ...

Samsung Electronics diversifies NAND production with TELs extreme cold etching equipment Samsung Electronics enhances chip ...

One of the most widely used techniques in semiconductor manufacturing, inductively coupled plasma reactive ion etching (ICP-RIE), offers high etching rates and excellent control over anisotropy.

Using 3D process models to predict the impact of mechanical stress on yield and performance. With the semiconductor industry ...

Dr. Ho Jin Ma's research team from the Nano Materials Research Division at the Korea Institute of Materials Science (KIMS), in collaboration with Professor Jeong-Woo Lee's research team from Pusan ...

Silicon is the best-known semiconductor material. However, controlled nanostructuring drastically alters the material's properties. Using a specially developed etching apparatus, a team at HZB has now ...

Akara extends decades of Lam leadership in conductor etch. This includes multiple generations of the company's highly ...

Silicon is the best-known semiconductor material. However, controlled nanostructuring drastically alters the material's properties. Using a specially developed etching apparatus, a team has now ...