A research team has successfully developed a new composition and processing technology for transparent plasma-resistant high-entropy ceramics. This innovation is the first of its kind in the world and ...

Silicon is the best-known semiconductor material. However, controlled nanostructuring drastically alters the material's properties. Using a specially developed etching apparatus, a team at HZB has now ...

Dr. Ho Jin Ma's research team from the Nano Materials Research Division at the Korea Institute of Materials Science (KIMS), in collaboration with Professor Jeong-Woo Lee's research team from Pusan ...

The Korea Research Institute of Standards and Science (KRISS) has successfully developed a system that diagnoses the lifetime ...

Using 3D process models to predict the impact of mechanical stress on yield and performance. With the semiconductor industry ...

Samsung Electronics diversifies NAND production with TELs extreme cold etching equipment Samsung Electronics enhances chip ...

The plasma process involves precisely etching the surface of a semiconductor substrate or depositing a specific material using a gas ionized into a plasma state. The plasma process is considered a ...

However, the process, known as reactive ion etching, isn't fully understood and could be improved. One recent development involves keeping the wafer––the sheet of semiconductor material to be ...

At least that’s [Sam]’s plan, which his new reactive-ion etching setup aims to make possible. While his Z1 dual differential amplifier chip was a huge success, the photolithography process he ...