1). Figure 1: Since the mid-1980s, the wavelength of light used in lithography systems has reduced by almost half from 365 nm to 193 nm. Extreme ultraviolet (EUV) lithography is the next step in ...

A research partnership led by Lawrence Livermore National Laboratory (LLNL) has been formed to investigate the next evolution of extreme ultraviolet (EUV) lithography. The team will participate in the ...

This advancement could pave the way for a new generation of 'beyond EUV' lithography systems that produce chips quicker and with less power. Of course, implementing BAT technologies into ...

上周，ASML 庆祝了一个重要的里程碑--该公司的社交媒体账户分享了其第三代极紫外光（EUV）光刻工具到达一位未具名客户的消息。帖子包括几张照片 ...