Plymouth Grating Laboratory has established the first commercial production system using Scanning Beam Interference Lithography (SBIL) to manufacture gratings and Nanoruled surface structures that can ...

Working at i-line (λ=364nm), with standard novolak resists, we have demonstrated features as small as 50 nm. The processing has been developed and demonstrated with an interferometric lithography tool ...

Optimized sub-resolution grating (SRG) feature placement is also becoming important to reduce double exposure background dose effects. Inverse lithography technology (ILT) holds much promise with ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Making use of this smart workflow, professional lithography becomes more accessible to everyone—no matter their level ... and optoelectronics benefit from the software solutions that are available. It ...