Atomic layer etching (ALE) is the reverse of atomic layer deposition (ALD). ALE can be achieved using sequential, self-limiting thermal reactions. We have recently demonstrated Al 2 O 3 ALE [1-3] and ...

the FlexAL atomic layer deposition (ALD) system provides a wide range of optimized high-quality plasma ALD and thermal ALD procedures. The ALD product line includes a variety of instruments to satisfy ...

The FirstNano EasyTube 101 CVD system is used for the growth of carbon nanotubes (CNTs). The system can grow areas up to 25 mm × 75 mm using an iron catalyst deposited by the Fredrick electron beam ...

Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The system involves alternating pulses of gaseous precursors that ...