Dr. Ho Jin Ma's research team from the Nano Materials Research Division at the Korea Institute of Materials Science (KIMS), ...

A research team has successfully developed a new composition and processing technology for transparent plasma-resistant ...

In a conventional plasma etching chamber, the incident ions bombard the surface and etch holes normal to the surface; angled etching is not possible even when the surface is tilted. To overcome ...

Both capacitively (RIE) and inductively (ICP) coupled plasma etcher with fluorine-based gases (CF4, CHF3, C4F8, SF6), BCl3, nitrogen, argon, and oxygen for anisotropic dry etching of Si-based ...

The discovery was partially accidental, as researchers happened upon it while looking at using high-energy plasma etching to machine ... Fresh from the plasma chamber, a wood sample has a thin ...

To this end, they prepared pencil lead samples and placed them in a plasma chamber for different periods ... of the clay ...

Standard NAND flash storage is used in microSD cards, USB drives, and solid-state drives in computers and phones. To fit more gigabytes into smaller spaces, manufacturers ...

The researchers compared results from this process to a more advanced cryo-etching process that uses hydrogen fluoride gas to create the plasma. "Cryo etch with the hydrogen fluoride plasma showed ...

Etching products are purified from the chamber. ALE of MoS 2 shows no Raman defect peak after etching, highlighting the low damage etching capabilities of ALE. Image Credit: Oxford Instruments Plasma ...

At least that’s [Sam]’s plan, which his new reactive-ion etching setup ... is added to the chamber. A high-voltage feedthrough provides the RF energy needed to create a plasma, which knocks ...