Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography.

Extreme-ultraviolet (EUV) lithography involves wavelengths of 13.5 nm, and thus represents the next significant step in the reduction of feature sizes on integrated circuits. However, the move ...

This platform gives TSMC the opportunity to take the next step forward in exploring multiple e-beam technology as a lithography option at 22 nanometer and more advanced process nodes. Multiple e-beam ...

indicating its readiness for circuit pattern printing. This achievement, referred to as 'first light on the wafer' marks a significant step forward in the field of High-NA EUV lithography.