Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

One of the most complex parts of this process is lithography: the step in which shapes are drawn onto a silicon wafer. There are several ways to do this, all of them rather complicated ...

EUV, extreme ultraviolet lithography, is nearly completely associated with the Dutch company ASML, the only maker of EUV machines that are used by TSMC, Intel and other chip manufacturers of advanced ...

The processing has been developed and demonstrated with an interferometric lithography tool. Ongoing work focuses on adapting this to projection tools though the use of new mask technologies.

Nanostencil lithography (NSL) is a shadow-mask-based nanopatterning technique that allows for the direct deposition of materials through a stencil mask with nanoscale openings. It enables the ...

Soft lithography is a family of non-photolithographic techniques used for fabricating micro- and nanostructures using elastomeric stamps, molds, and conformable photomasks. Unlike conventional ...