半导体前驱体是ALD和CVD薄膜沉积工艺的核心材料，是用于形成符合半导体制造要求的各类薄膜层的核心原材料。薄膜沉积工艺是晶圆制造的三大核心 ...

The ALD process alternates between the introduction of two or more precursor gases into ... with precise control over the film's structure and properties. CVD Coatings: Can be deposited at a thicker ...

A patented, built-in abatement ensures less maintenance and surpasses the all-time records of legacy PVD and CVD equipment. The HELIOS coating system is simple, modular and flexible, delivering ...

CVD techniques, such as plasma-enhanced CVD (PECVD) and low-pressure CVD (LPCVD), enable the deposition of high-quality, conformal films with excellent step coverage. ALD is a highly precise and ...